The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Apr. 20, 2005
Larry Roger Barnett, Hsinchu, TW;
Kwo Ray Chu, Hsinchu, TW;
Tsun-hsu Chang, Hsinchu, TW;
Hung-i Chang, Hsinchu, TW;
Wei-yuan Chiang, Hsinchu, TW;
Ching-fang Yu, Hsinchu, TW;
Ling-chieh Tai, Hsinchu, TW;
Syh-yuh Cheng, Hsinchu, TW;
Chwung-shan Kou, Hsinchu, TW;
Larry Roger Barnett, Hsinchu, TW;
Kwo Ray Chu, Hsinchu, TW;
Tsun-Hsu Chang, Hsinchu, TW;
Hung-I Chang, Hsinchu, TW;
Wei-Yuan Chiang, Hsinchu, TW;
Ching-Fang Yu, Hsinchu, TW;
Ling-Chieh Tai, Hsinchu, TW;
Syh-Yuh Cheng, Hsinchu, TW;
Chwung-Shan Kou, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A quasi-optical material treatment apparatus includes a first mirror and a second mirror. The first mirror is arched, and has a focal point in a chamber distance, and a coupling port to receive a high power microwave from an external microwave source that travels along the chamber distance to output a strong field microwave beam. The second mirror and the first mirror jointly form a quasi-optical action chamber and are movable relative to each other to adjust the total chamber distance between the two. A material to be treated may be moved through a focusing zone (about one wavelength of the strong field microwave beam) of the strong field microwave beam to be treated rapidly and evenly.