The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2008

Filed:

Apr. 01, 2004
Applicants:

James P. Godschalx, Midland, MI (US);

Robert E. Hefner, Jr., Lake Jackson, TX (US);

Q. Jason Niu, Excelsior, MN (US);

H. Craig Silvis, Midland, MI (US);

Inventors:

James P. Godschalx, Midland, MI (US);

Robert E. Hefner, Jr., Lake Jackson, TX (US);

Q. Jason Niu, Excelsior, MN (US);

H. Craig Silvis, Midland, MI (US);

Assignee:

Dow Global Technologies Inc., Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 49/537 (2006.01); C08F 36/00 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A monomer suitable for use in forming low dielectric constant films in semiconductor devices comprising i) two dienophile groups (A-functional groups) attached to a single aromatic ring and ii) a second ring structure comprising two conjugated carbon-to-carbon double bonds and a leaving group L (B-functional group), characterized in that said single aromatic ring is directly covalently attached to one of the double bonded carbons of the B functional group or to a fused aromatic ring containing two such double bonded carbons of the B-functional group, and one A-functional group of one monomer is capable of reaction under cycloaddition reaction conditions with the B-functional group of a second monomer to thereby form a polymer.


Find Patent Forward Citations

Loading…