The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Apr. 11, 2005
Kazuhiko Kunimoto, Takatsuki, JP;
Hidetaka Oka, Takarazuka, JP;
Masaki Ohwa, Kobe, JP;
Junichi Tanabe, Takarazuka, JP;
Hisatoshi Kura, Hyogo, JP;
Jean-luc Birbaum, Binningen, CH;
Kazuhiko Kunimoto, Takatsuki, JP;
Hidetaka Oka, Takarazuka, JP;
Masaki Ohwa, Kobe, JP;
Junichi Tanabe, Takarazuka, JP;
Hisatoshi Kura, Hyogo, JP;
Jean-Luc Birbaum, Binningen, CH;
Ciba Specialty Chemicals Corporation, Tarrytown, NY (US);
Abstract
Compounds of the formulae I, II, III, IV and V wherein optionally substituted; or Aris naphthyl or anthracyl each of which is unsubstituted or substituted; or Aris benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Aris 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ari.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; Mwhen x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M, when x is 3, is a trivalent radical; Mfor example is Mis for example C-Calkylene, cyclohexylene, or phenylene; n is 1-20; Ris for example hydrogen or C-Calkyl; R' i.a. is C-Calkyl; substituted or —O-interrupted C-Calkyl; Ris for example hydrogen, or C-Calkyl; and Rand Rindependently of each other i.a. are hydrogen, C-Calkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.