The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Apr. 27, 2005
Hisashi Minemoto, Osaka, JP;
Yasuo Kitaoka, Osaka, JP;
Isao Kidoguchi, Hyogo, JP;
Yusuke Mori, Suita-shi, Osaka, JP;
Fumio Kawamura, Osaka, JP;
Takatomo Sasaki, Osaka, JP;
Hidekazu Umeda, Osaka, JP;
Yasuhito Takahashi, Osaka, JP;
Hisashi Minemoto, Osaka, JP;
Yasuo Kitaoka, Osaka, JP;
Isao Kidoguchi, Hyogo, JP;
Yusuke Mori, Suita-shi, Osaka, JP;
Fumio Kawamura, Osaka, JP;
Takatomo Sasaki, Osaka, JP;
Hidekazu Umeda, Osaka, JP;
Yasuhito Takahashi, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Other;
Abstract
A manufacturing apparatus of Group III nitride crystals and a method for manufacturing Group III nitride crystals are provided, by which high quality crystals can be manufactured. For instance, crystals are grown using the apparatus of the present invention as follows. A crystal raw material () and gas containing nitrogen are introduced into a reactor vessel (), to which heat is applied by a heater (), and crystals are grown in an atmosphere of pressure applied thereto. The gas is introduced from a gas supplying device () to the reactor vessel () through a gas inlet of the reactor vessel, and then is exhausted to the inside of a pressure-resistant vessel () through a gas outlet of the reactor vessel. Since the gas is introduced directly to the reactor vessel () without passing through the pressure-resistant vessel (), the mixture of impurities attached to the pressure-resistant vessel () and the like into the site of the crystal growth can be prevented. Further, since the gas flows through the reactor vessel (), there is no aggregation of an evaporating alkali metal, etc., at the gas inlet or the like, and such an alkali metal does not flow into the gas supplying device (). As a result, the quality of Group III nitride crystals obtained can be improved.