The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
May. 07, 2007
Yoshihisa Beppu, Yokohama, JP;
Tomohiro Sakai, Yokohama, JP;
Satoshi Kashiwabara, Yokohama, JP;
Kazuo Sunahara, Yokohama, JP;
Yoshihisa Beppu, Yokohama, JP;
Tomohiro Sakai, Yokohama, JP;
Satoshi Kashiwabara, Yokohama, JP;
Kazuo Sunahara, Yokohama, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
To provide a process for producing CeOfine particles having high crystallinity, being excellent in uniformity of composition and particle size and having a small particle size, and a polishing slurry containing such fine particles. A process for producing CeOfine particles, which comprises a step of obtaining a melt containing, as represented by mol % based on oxides, from 5 to 50% of CeO, from 10 to 50% of RO (wherein R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba) and from 30 to 75% of BO, a step of quenching the melt to obtain an amorphous material, a step of precipitating CeOcrystals from the amorphous material, and a step of separating the CeOcrystals from the obtained crystallized product, in this order. A polishing slurry containing from 0.1 to 20 mass % of such fine particles.