The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2008

Filed:

Feb. 23, 2006
Applicants:

Baris Dundar, San Pablo, CA (US);

Raymond Rui-feng Liao, Pleasanton, CA (US);

Wei Yu, Albany, CA (US);

Jaimyoung Kwon, Alameda, CA (US);

Inventors:

Baris Dundar, San Pablo, CA (US);

Raymond Rui-Feng Liao, Pleasanton, CA (US);

Wei Yu, Albany, CA (US);

Jaimyoung Kwon, Alameda, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for generating radio frequency (RF) planning modeling data for an object. The method includes placing an RF signal source near the object and sequentially positioning a receiver at a plurality of locations around the object. At each of the locations, an indication is provided to the receiver that it is at a measurement location, and the receiver is allowed to detect a level of the RF signal produced by the RF signal source at the measurement location. In another aspect, an opening in an object is modeled as a virtual object that overlaps with the object and has a 'negative attenuation' characteristic to cancel out the 'positive attenuation' characteristic of the object.


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