The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Dec. 03, 2004
Thomas F. Rust, Oakland, CA (US);
Robert N. Stark, Saratoga, CA (US);
Thomas L. Noggle, Oakland, CA (US);
Daniel F. Cribbs, Los Gatos, CA (US);
Thomas F. Rust, Oakland, CA (US);
Robert N. Stark, Saratoga, CA (US);
Thomas L. Noggle, Oakland, CA (US);
Daniel F. Cribbs, Los Gatos, CA (US);
Nanochip, Inc., Fremont, CA (US);
Abstract
Methods in accordance with the present invention can be applied, in an embodiment, to a media comprising a phase change material to alter a resolved portion of the phase change material to have a resistance different from a resistance of the bulk material. A tip having a substantially larger radius of curvature than the resolved portion can be employed by applying such methods. A substantially anisotropic columnar material can focus a current applied between the tip and the media so that the portion is narrower in width than the radius of curvature. Such highly resolved portions form bits in the media. Other objects, aspects and advantages of the invention can be obtained from reviewing the figures, specification and claims. This description is not intended to be a complete description of, or limit the scope of, the invention.