The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2008

Filed:

Jul. 13, 2006
Applicants:

Hiroshi Osawa, Utsunomiya, JP;

Akinori Ohkubo, Utsunomiya, JP;

Kenji Yamazoe, Utsunomiya, JP;

Inventors:

Hiroshi Osawa, Utsunomiya, JP;

Akinori Ohkubo, Utsunomiya, JP;

Kenji Yamazoe, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for exposing a pattern of a mask onto a plate to be exposed, the exposure apparatus includes a cleaning apparatus for cleaning the mask. The cleaning apparatus includes an irradiating part for irradiating a laser beam to the mask, and a polarization controller for controlling a polarization characteristic of the laser beam according to a longitudinal direction of the pattern.


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