The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2008

Filed:

Jun. 23, 2004
Applicants:

Y. Dan Rubinstein, Mountain View, CA (US);

Anoop Singhal, Santa Clara, CA (US);

Inventors:

Y. Dan Rubinstein, Mountain View, CA (US);

Anoop Singhal, Santa Clara, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a method for matching micromirror wafers and electrode wafers so as to form micromirror array devices while the production yield is maximized. Each micromirror wafer and/or electrode wafer may have one or more non-passing dies and a plurality of good dies. A set of matching schemes are defined for matching each micromirror wafer with an electrode wafer. For each matching scheme, a cost is calculated with the cost being defined as a total number of unmatched die assemblies resulted from the matching scheme, wherein the unmatched die assembly is defined as an assembly consisting of a passing and non-passing die. Then a matching scheme is selected from the defined matching scheme such that the calculated cost is the minimum among the calculated costs of the defined matching schemes.


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