The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Jan. 05, 2004
Sung-chul Kang, Yongin, KR;
Jin-ho Ju, Seoul, KR;
You-kyoung Lee, Suwon, KR;
Dong-ki Lee, Seoul, KR;
Hyo-youl Kim, Suwon, KR;
Hoon Kang, Seoul, KR;
Seung-uk Lee, Seoul, KR;
Byung-uk Kim, Hwaseong, KR;
Sung-Chul Kang, Yongin, KR;
Jin-Ho Ju, Seoul, KR;
You-Kyoung Lee, Suwon, KR;
Dong-Ki Lee, Seoul, KR;
Hyo-Youl Kim, Suwon, KR;
Hoon Kang, Seoul, KR;
Seung-Uk Lee, Seoul, KR;
Byung-Uk Kim, Hwaseong, KR;
Abstract
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits. The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.