The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Feb. 17, 2005
Kazuhiro Hattori, Tokyo, JP;
Shuichi Okawa, Tokyo, JP;
Takahiro Suwa, Tokyo, JP;
Mikiharu Hibi, Tokyo, JP;
Kazuhiro Hattori, Tokyo, JP;
Shuichi Okawa, Tokyo, JP;
Takahiro Suwa, Tokyo, JP;
Mikiharu Hibi, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A method for manufacturing a magnetic recording medium is provided, by which a magnetic recording medium having a recording layer formed in a concavo-convex pattern, a sufficiently flat surface, and high recording and reproducing precision is efficiently manufactured. In a non-magnetic material filling step, a non-magnetic material is deposited over a recording layer formed in a predetermined concavo-convex pattern over a substrate to fill concave portions of the concavo-convex pattern with the non-magnetic material. In a flattening step, an excess part of the non-magnetic material above the recording layer is removed by dry etching, to flatten surfaces of the recording layer and the non-magnetic material. Processing conditions are set so as to substantially equalize an etching rate of the non-magnetic material with an etching rate of the recording layer with respect to the dry etching in the flattening step.