The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Jun. 03, 2004
Koichi Wago, Sunnyvale, CA (US);
Hongying Wang, Fremont, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Gennady Gauzner, Livermore, CA (US);
Neil Deeman, Alamo, CA (US);
Koichi Wago, Sunnyvale, CA (US);
HongYing Wang, Fremont, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Gennady Gauzner, Livermore, CA (US);
Neil Deeman, Alamo, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A method of fabricating a patterned magnetic layer comprises sequential steps of: (a) providing a workpiece comprising a non-magnetic substrate, a layer of magnetic material overlying a surface of the substrate, and a layer of a non-magnetic material overlying the layer of magnetic material; (b) forming a layer of a mask material on the layer of non-magnetic material; (c) forming a topographical pattern comprising a plurality of recesses in the layer of mask material; (d) selectively removing portions of the layer of non-magnetic material proximate lower portions of the recesses, thereby exposing selected portions of the layer of magnetic material; (e) treating the exposed portions of the layer of magnetic material with a liquid for reducing the magnetic properties thereof; and (f) removing the topographically patterned layer of mask material.