The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2008

Filed:

May. 26, 2005
Applicants:

Stewart N. Middlemiss, Salt Lake City, UT (US);

J. Daniel Belnap, Pleasant Grove, UT (US);

Nephi Mourik, Provo, UT (US);

Thomas W. Oldham, The Woodlands, TX (US);

Anthony Griffo, The Woodlands, TX (US);

Inventors:

Stewart N. Middlemiss, Salt Lake City, UT (US);

J. Daniel Belnap, Pleasant Grove, UT (US);

Nephi Mourik, Provo, UT (US);

Thomas W. Oldham, The Woodlands, TX (US);

Anthony Griffo, The Woodlands, TX (US);

Assignee:

Smith International, Inc., Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 10/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Thermally stable ultra-hard compact constructions of this invention comprise an ultra-hard material body that includes a thermally stable region positioned adjacent a surface of the body. The thermally stable region is formed from consolidated materials that are thermally stable at temperatures greater than about 750° C. The thermally stable region can occupy a partial portion of or the entire ultra-hard material body. The ultra-hard material body can comprise a composite of separate ultra-hard material elements that each form different regions of the body, at least one of the regions being thermally stable. The ultra-hard material body is attached to a desired substrate, an intermediate material is interposed between the body and the substrate, and the intermediate material joins the substrate and body together by high pressure/high temperature process.


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