The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Nov. 26, 2002
Andre Delage, Ottawa, CA;
Boris Lamontagne, Gatineau, CA;
Kokou Dossou, Newtown, AU;
Siegfried Janz, Ottawa, CA;
Pavel Cheben, Ottawa, CA;
Lynden Erickson, Cumberland, CA;
Dan-xia Xu, Gloucester, CA;
Sylvain Charbonneau, Cumberland, CA;
Andre Delage, Ottawa, CA;
Boris Lamontagne, Gatineau, CA;
Kokou Dossou, Newtown, AU;
Siegfried Janz, Ottawa, CA;
Pavel Cheben, Ottawa, CA;
Lynden Erickson, Cumberland, CA;
Dan-Xia Xu, Gloucester, CA;
Sylvain Charbonneau, Cumberland, CA;
Enablence Inc., Kanata, Ontario, CA;
Abstract
An Echelle grating has alternate first () and second () sets of facets (). The first set of facets () is operative to reflect incident light () for diffraction and the second set of facets () extends between adjacent facets of the first set (). Only the first set of facets () is metallized to enhance reflection. The second set of facets () is left unmetallized. This configuration reduces polarization dependent loss (PDL).