The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2008

Filed:

Jun. 16, 2006
Applicants:

Martin A. Putnam, Cheshire, CT (US);

John Moon, Wallingford, CT (US);

Paul S. Szczepanek, Middletown, CT (US);

Tuo LI, East Lyme, CT (US);

Anthony Rauseo, Kensington, CT (US);

Joseph Traynor, Woburn, MA (US);

Inventors:

Martin A. Putnam, Cheshire, CT (US);

John Moon, Wallingford, CT (US);

Paul S. Szczepanek, Middletown, CT (US);

Tuo Li, East Lyme, CT (US);

Anthony Rauseo, Kensington, CT (US);

Joseph Traynor, Woburn, MA (US);

Assignee:

Cyvera Corporation, Wallingford, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing optical identification elements that includes forming a diffraction grating in a fiber substrate along a longitudinal axis of the substrate. The grating includes a resultant refractive index variation. The method also includes cutting the substrate transversely to form a plurality of optical identification elements that have the grating therein along substantially the entire length of the elements. Each of the elements has substantially the same resultant refractive index variation.


Find Patent Forward Citations

Loading…