The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Apr. 20, 2006
Applicant:
Yuval Zur, Haifa, IL;
Inventor:
Yuval Zur, Haifa, IL;
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Phase and magnitude correction is performed in two dimensions to reduce ghosting in single shot and multi-shot EPI scans. First, a phase/magnitude correction in the readout direction is carried out to reduce echo shifts and gradient waveform distortions. Then, a two dimensional phase/magnitude correction is performed to remove the remaining xy phase/magnitude errors.
Zur, Yuval. (2008). Method and apparatus of mr imaging with two dimensional phase and magnitude correction (U.S. Patent No. 7375519). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7375519
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile