The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2008

Filed:

Aug. 04, 2005
Applicants:

Safwat Tadros, Evansville, IN (US);

Parminder Agarwal, Evansville, IN (US);

Shreyas Chakravarti, Evansville, IN (US);

Peter Vollenberg, Evansville, IN (US);

Inventors:

Safwat Tadros, Evansville, IN (US);

Parminder Agarwal, Evansville, IN (US);

Shreyas Chakravarti, Evansville, IN (US);

Peter Vollenberg, Evansville, IN (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 20/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a film or sheet comprises deforming a polymeric alloy at a temperature effective to impart to the deformed alloy a birefringence retardation of greater than or equal to about 750 nanometers. A method eliminating comets and veins in an optical film or sheet comprises annealing the film or sheet to a temperature greater than the lowest glass transition temperature of the polymeric resins contained in the alloy. A composition comprises a first polymeric resin in an amount of about 1 to about 99 wt %; and a second polymeric resin in an amount of about 1 to about 99 wt %, wherein the polymeric resins are blended with a deforming force effective to produce a polymeric alloy having a birefringence retardation of greater than or equal to about 750 nanometers.


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