The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2008

Filed:

Feb. 11, 2005
Applicants:

Robert E. Herman, Lindenhurst, IL (US);

John Chapman, Lake Villa, IL (US);

Chong-son Sun, Lake Forest, IL (US);

Jean M Mathias, Lillois, BE;

Daniel F. Bischof, McHenry, IL (US);

Inventors:

Robert E. Herman, Lindenhurst, IL (US);

John Chapman, Lake Villa, IL (US);

Chong-Son Sun, Lake Forest, IL (US);

Jean M Mathias, Lillois, BE;

Daniel F. Bischof, McHenry, IL (US);

Assignee:

Fenwal, Inc., Lake Zurich, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N 1/02 (2006.01); A61B 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods treat plasma carrying contaminants and cellular matter that are capable of entraining contaminants. The systems and methods separate cellular matter from the plasma by filtration, thereby removing contaminants entrained within the cellular matter. The system and methods add to the plasma a photoactive material. The systems and methods emit radiation at a selected wavelength into the plasma to activate the photoactive material and thereby eradicate the contaminant that is free of entrainment by cellular matter.


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