The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Nov. 28, 2002
Tsuneaki Maesawa, Saitama, JP;
Fumiyoshi Urano, Saitama, JP;
Masayuki Endo, Osaka, JP;
Masaru Sasago, Osaka, JP;
Tsuneaki Maesawa, Saitama, JP;
Fumiyoshi Urano, Saitama, JP;
Masayuki Endo, Osaka, JP;
Masaru Sasago, Osaka, JP;
Wako Pure Chemical Industries Ltd., Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Kadoma-Shi, JP;
Abstract
The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid generator and a resist composition using said compound and a method for pattern formation using said composition, and further relates to a synthetic n intermediate for a bisimide compound and a bis(N-hydroxy)phthalimide compound useful as an intermediate for a functional compound such as a heat resistant polymer or photosensitive material, and provides a bisimide compound shown by the general formula [1]: (wherein R and Aare as defined in claim).