The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Nov. 15, 2005
Mitsuhito Suwa, Shiga, JP;
Takenori Fujiwara, Shiga, JP;
Masahide Senoo, Shiga, JP;
Hirokazu Iimori, Shiga, JP;
Mitsuhito Suwa, Shiga, JP;
Takenori Fujiwara, Shiga, JP;
Masahide Senoo, Shiga, JP;
Hirokazu Iimori, Shiga, JP;
Toray Industries, Inc., Tokyo, JP;
Abstract
A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 μm of film thickness at a wavelength of 400 nm of 95% or more.