The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Feb. 09, 2006
Applicants:
Hung-chin Guthrie, Saratoga, CA (US);
Ming Jiang, San Jose, CA (US);
Nick Lara, Gilroy, CA (US);
John Jaekoyun Yang, San Ramon, CA (US);
Inventors:
Hung-Chin Guthrie, Saratoga, CA (US);
Ming Jiang, San Jose, CA (US);
Nick Lara, Gilroy, CA (US);
John Jaekoyun Yang, San Ramon, CA (US);
Assignee:
Hitachi Global Storage Technologies Netherlands BV, Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-mechanical polishing (CMP), without causing corrosion and roughness. This process may be used on all CMP layers in thin film magnetic head wafer fabrication.