The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Aug. 06, 2003
Igor Ivanisevic, West Lafayette, IN (US);
Simon Bates, West Lafayette, IN (US);
David E. Bugay, West Lafayette, IN (US);
Barbara C. Stahly, West Lafayette, IN (US);
Donald R. Hallenbeck, West Lafayette, IN (US);
Igor Ivanisevic, West Lafayette, IN (US);
Simon Bates, West Lafayette, IN (US);
David E. Bugay, West Lafayette, IN (US);
Barbara C. Stahly, West Lafayette, IN (US);
Donald R. Hallenbeck, West Lafayette, IN (US);
SSCI, Inc., West Lafayette, IN (US);
Abstract
A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.