The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
May. 04, 2007
Masashi Tanaka, Yokohama, JP;
Masato Kumazawa, Kawasaki, JP;
Kinya Kato, Yokohama, JP;
Masaki Kato, Yokohama, JP;
Hiroshi Chiba, Yokohama, JP;
Hiroshi Shirasu, Yokohama, JP;
Masashi Tanaka, Yokohama, JP;
Masato Kumazawa, Kawasaki, JP;
Kinya Kato, Yokohama, JP;
Masaki Kato, Yokohama, JP;
Hiroshi Chiba, Yokohama, JP;
Hiroshi Shirasu, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.