The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Sep. 12, 2006
Kyunghyun Sung, Los Angeles, CA (US);
Krishna Nayak, Los Angeles, CA (US);
KyungHyun Sung, Los Angeles, CA (US);
Krishna Nayak, Los Angeles, CA (US);
University of Southern California, Los Angeles, CA (US);
Abstract
A method and system are described for compensating for non-uniformity of excitation field B1+ in magnetic resonance imaging (MRI) of an object. The variation in the RF excitation field B1+ is measured over a region of interest (ROI) in the object, the B1+ field causing nuclear spins in the object to flip at a flip angle when B1+ is applied to the object. The flip angle profile is designed to be proportional to a reciprocal of the measured variation in the excitation field B1+. One or more control parameters of the estimated flip angle profile is adjusted, in accordance with the measured variation in B1+, so as to cancel out variation in actual flip angle until a profile of the actual flip angle is achieved that is substantially uniform throughout the ROI.