The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Oct. 03, 2005
William R. Livesay, San Diego, CA (US);
Scott M. Zimmerman, Baskin Ridge, NJ (US);
William R. Livesay, San Diego, CA (US);
Scott M. Zimmerman, Baskin Ridge, NJ (US);
C-Beam & Light, Inc., San Diego, CA (US);
Abstract
A controlled electron beam and heat will decrease the birefringence of a halogenated optical material under tensile stress. The electron beam and heat irradiation will occur in a chamber under near vacuum conditions. After electron beam irradiation and heating, the crystalline structure of the halogenated optical material layer has been randomized and made amorphous. The electron beam irradiation and heating will lower the high index of refraction of the halogenated optical material under stress and raise the low index of refraction of the halogenated optical material under stress. The differences in index of refraction between the high index of refraction area of and the low index of refraction area decrease which decreases the birefringence of the halogenated optical material under stress.