The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Dec. 19, 2005
Jeong-min Park, Seoul, KR;
Hi-kuk Lee, Gyeonggi-do, KR;
Woo-seok Jeon, Seoul, KR;
Joo-han Kim, Gyeonggi-do, KR;
Doo-hee Jung, Seoul, KR;
Jeong-Min Park, Seoul, KR;
Hi-kuk Lee, Gyeonggi-do, KR;
Woo-Seok Jeon, Seoul, KR;
Joo-Han Kim, Gyeonggi-do, KR;
Doo-Hee Jung, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A method for manufacturing a thin film transistor array panel using a photo mask is provided. The photo mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface to manufacture a thin film transistor array panel. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.