The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Feb. 03, 2006
Applicants:

Fumihiro Minami, Yokohama, JP;

Toshiya Kotani, Machida, JP;

Inventors:

Fumihiro Minami, Yokohama, JP;

Toshiya Kotani, Machida, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for generating layout data of a semiconductor integrated circuit includes applying optical proximity correction conditions to cells so as to generate cell patterns, selecting cell patterns to correspond cells, based on layout information of cells along a specified signal propagating path; calculating delay times for the signal propagating path for combinations of cell patterns; selecting a combination of cell patterns, based on lengths of the calculated delay times and the allowable delay time; and generating layout data of the signal propagating path using the selected combination.


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