The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Nov. 25, 2003
Ioana M. Boier-martin, Pelham Manor, NY (US);
Denis Zorin, New York, NY (US);
Ioana M. Boier-Martin, Pelham Manor, NY (US);
Denis Zorin, New York, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system, method, and program product for re-parameterizing one or more three-dimensional Catmull-Clark models is disclosed. Each of the models has one or more surfaces and one or more extraordinary vertices. One or more adjacent iso-parameter lines of the model have a spacing between them that increases as the iso-parameter lines approach the extraordinary vertex. A re-parameterization process that re-parameterizes the model so that one or more of the extraordinary vertices have adjacent iso-parameter lines with spacing that does not increase as the lines approach the extraordinary vertex.