The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Dec. 28, 2004
Applicants:

Sei Umisedo, Kyoto, JP;

Nariaki Hamamoto, Kyoto, JP;

Inventors:

Sei Umisedo, Kyoto, JP;

Nariaki Hamamoto, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A beam current density distribution in y direction of an ion beamat a position of a forestage beam restricting shutteris measured by measuring a change in a beam current of the ion beamincident on a forestage multipoint Faradayby passing an outer side of a sideof the shutterwhile driving the forestage beam restricting shutterin y direction by a forestage shutter driving apparatus. Further, a beam current density distribution in y direction of the ion beamat a position of a poststage beam restricting shutteris measured by measuring a change in the beam current of the ion beamincident on a poststage multipoints Faradayby passing an outer side of a sideof the shutterwhile driving the poststage beam restricting shutterin y direction by a poststage shutter driving apparatus. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beamis measured by using a result of the measurement.


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