The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Sep. 27, 2004
Applicants:

Sharon Xiaorong Wang, Hoffman Estates, IL (US);

James T. Chapman, Glen Ellyn, IL (US);

Ronald E. Malmin, Chicago, IL (US);

Trudy Dayle Rempel, Glen Ellyn, IL (US);

Fred E. Macciocchi, Huntley, IL (US);

James Frank Caruba, Bartlett, IL (US);

Inventors:

Sharon Xiaorong Wang, Hoffman Estates, IL (US);

James T. Chapman, Glen Ellyn, IL (US);

Ronald E. Malmin, Chicago, IL (US);

Trudy Dayle Rempel, Glen Ellyn, IL (US);

Fred E. Macciocchi, Huntley, IL (US);

James Frank Caruba, Bartlett, IL (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01T 1/161 (2006.01);
U.S. Cl.
CPC ...
Abstract

In some preferred embodiments, an apparatus is provided that facilitates correction, such as, e.g., linearity correction, in imaging devices, such as, e.g., scintillation cameras. In preferred embodiments, a mask is implemented that can produce images for locating the actual position of a nuclear event based on its apparent position with high accuracy and reliability. In the preferred embodiments, the mask includes a non-uniform array of apertures that can achieve this goal.


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