The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Oct. 24, 2006
Applicants:

Keiji Yurugi, Osaka, JP;

Hiroko Yamaguchi, Osaka, JP;

Inventors:

Keiji Yurugi, Osaka, JP;

Hiroko Yamaguchi, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 69/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

It is an object of the present invention to provide a vinyl ether group-containing, (meth)acrylic ester, which has both radical polymerizability and cation polymerizability, improved in storage stability and stability in handling without impairing its polymerizability or, in other words, provide a stabilized vinyl ether group-containing (meth)acrylic ester. Another object is to provide a method of producing a stabilized vinyl ether group-containing (meth)acrylic ester composition. A further object is to provide a method of stably handing, a method of economically and stably producing and a method of purifying a vinyl ether group-containing (meth)acrylic ester. A vinyl ether group-containing (meth)acrylic ester composition which comprises a radical polymerization inhibitor and a vinyl ether group-containing (meth)acrylic ester represented by the following general formula (1):CH2=CR1-COO—R2-O—CH—CH—R3  (1)in the formula, R1 represents a hydrogen atom or a methyl group, R2 represents an organic residue and R3 represents a hydrogen atom or an organic residue.


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