The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Jun. 05, 2006
Applicant:

Rosemary A. Gaudreault, Park Ridge, IL (US);

Inventor:

Rosemary A. Gaudreault, Park Ridge, IL (US);

Assignee:

Jelmar LLC, Skokie, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/92 (2006.01); C11D 3/44 (2006.01); C11D 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A hard surface cleaning solution having improved cleaning and descaling properties. In one formulation, the cleaning solution comprises a first organic acid, a second organic acid, a surfactant, a solvent and a diluent. The first organic acid is a carboxylic acid preferably comprising lactic acid, while the second organic acid is a carboxylic acid preferably comprising gluconic acid. The surfactant is selected from the group consisting of sultaines, betaines and amino propionates. The solvent is a an alkoxylated alcohol preferably selected from the propylene glycol ether class of compounds. In a second formulation, the cleaning solution comprises a first organic acid, a surfactant, a solvent and a diluent. The first organic acid is a carboxylic acid preferably comprising lactic acid, while the surfactant is selected from the group consisting of sultaines, betaines and amino propionates and the solvent is a an alkoxylated alcohol preferably selected from the propylene glycol ether class of compounds. The cleaning solutions may also include other components such as colorants, fragrance enhancers, corrosion inhibitors, nonionic surfactants or other additives.


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