The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Dec. 20, 2005
Sang-jung Kim, Kyungki-do, KR;
Jong-yong Kim, Kyungki-do, KR;
Deog-bae Kim, Kyungki-do, KR;
Jae-hyun Kim, Kyungki-do, KR;
Sang-Jung Kim, Kyungki-do, KR;
Jong-Yong Kim, Kyungki-do, KR;
Deog-Bae Kim, Kyungki-do, KR;
Jae-Hyun Kim, Kyungki-do, KR;
Dongjin Semichem Co., Ltd., , KR;
Abstract
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented by wherein, Ris hydrogen or methyl group, and Ris a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-reflective coating layer includes the polymer having the repeating unit represented by above Formulas; a light absorber; and a solvent.