The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Mar. 31, 2006
Applicants:

Andrea S. Rivers, Bloomfield, NY (US);

Timothy J. Tredwell, Fairport, NY (US);

Robert H. Cuffney, Honeoye Falls, NY (US);

James T. Stoops, Walworth, NY (US);

Joshua M. Cobb, Victor, NY (US);

Inventors:

Andrea S. Rivers, Bloomfield, NY (US);

Timothy J. Tredwell, Fairport, NY (US);

Robert H. Cuffney, Honeoye Falls, NY (US);

James T. Stoops, Walworth, NY (US);

Joshua M. Cobb, Victor, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for dynamically registering multiple patterned layers on a substrate () comprises: depositing a first layer on the substrate; printing a first pattern () on the first layer; depositing a second layer on the first pattern; and printing a second pattern on the second layer while dynamically detecting the first pattern to align the second pattern with the first pattern.


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