The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Aug. 06, 2004
Toshio Banba, Tokyo, JP;
Takashi Hirano, Tokyo, JP;
Toshio Banba, Tokyo, JP;
Takashi Hirano, Tokyo, JP;
Sumitomo Bakelite Co., Ltd., Tokyo, JP;
Abstract
The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure represented by the formula (2), further a positive-working photosensitive resin composition comprising a diazoquinone compound, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device: wherein, X is an organic group of 2 to 4 valences; Y is an organic group of 2 to 6 valences; Ris a hydroxyl group or —O—Rwherein m is an integer of 0 to 2; Ris a hydroxyl group, a carboxyl group, —O—Ror —COO—Rwherein n is an integer of 0 to 4; Ris an organic group having 1 to 15 carbon atoms; wherein, each of Rand Ris a divalent organic group; each of Rand Ris a monovalent organic group; n is an integer of 0 to 20.