The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Feb. 14, 2006
James L. Nix, Gilroy, CA (US);
Neil Leslie Robertson, Palo Alto, CA (US);
Mason Lamar Williams, San Jose, CA (US);
James L. Nix, Gilroy, CA (US);
Neil Leslie Robertson, Palo Alto, CA (US);
Mason Lamar Williams, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method is provided for fabricating a head for perpendicular recording with self-aligning side shields. The voids where the side shields will be formed are milled into the layer of material for the pole tip to achieve self-alignment. A mask is patterned with openings defining initial shape of the pole piece tip nearest the air-bearing surface including the width and the point at which the pole tip widens out. A film of soft magnetic material to form the side shields is deposited over the wafer. A chemical-mechanical-polishing process is preferably used to remove the mask and the material deposited on it. A new mask is patterned over the predetermined area for the final shape of the pole tip and the side shields. The excess side shield material and pole tip material outside of the mask is then removed.