The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
Mar. 20, 2003
Kerry A. Kravec, Bethel Park, PA (US);
Ali G. Saidi, Austin, TX (US);
Jan M. Slyfield, San Jose, CA (US);
Pascal R. Tannhof, Fontainebleau, FR;
Kerry A. Kravec, Bethel Park, PA (US);
Ali G. Saidi, Austin, TX (US);
Jan M. Slyfield, San Jose, CA (US);
Pascal R. Tannhof, Fontainebleau, FR;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and apparatus for determining a closest match of N input patterns relative to R reference patterns using K processing units. Each of a set of input patterns are loaded into the K processing units. One of the Reference patterns is sequentially loaded into each of the processing units and a distance defining the similarity between the reference pattern and each of the input patterns is calculated. A present calculated distance replaces its corresponding stored present minimum distance if it is has a smaller value. After the R reference patterns have been processed the minimum distance and its corresponding identification for all N input patterns is determined without merging outputs. The minimum distances and the identifications may be read either in parallel or serially. The apparatus is easily scalable by adding processors. The number of reference patterns may be easily increased without altering system configuration.