The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2008

Filed:

Aug. 02, 2006
Applicants:

Cuiling Gong, Plano, TX (US);

Larry J. Hornbeck, Van Alstyne, TX (US);

Jason M. Neidrich, Fairview, TX (US);

Inventors:

Cuiling Gong, Plano, TX (US);

Larry J. Hornbeck, Van Alstyne, TX (US);

Jason M. Neidrich, Fairview, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02B 26/08 (2006.01); G02B 6/26 (2006.01); H02N 1/00 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of tilting a micromirror includes forming a substrate, a micromirror outwardly from the substrate, and at least one electrode inwardly from the micromirror. The method further includes applying, by the at least one electrode, electrostatic forces sufficient to pivot the micromirror about a pivot point. In addition, the method includes providing the at least one electrode with a sloped outer surface. The sloped outer surface has a first end and a second end. The second end is closer to the pivot point than the first end, and the first end is closer to the substrate than the second end. The method also includes providing at least a portion of the at least one electrode with material properties that at least partially contribute to the sloped profile of the sloped outer surface.


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