The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2008

Filed:

Oct. 24, 2005
Applicants:

Qingying HU, Clifton Park, NY (US);

Kevin George Harding, Nishkayuna, NY (US);

Joseph Benjamin Ross, Cincinnati, OH (US);

Donald Wagner Hamilton, Burnt Hills, NY (US);

Inventors:

Qingying Hu, Clifton Park, NY (US);

Kevin George Harding, Nishkayuna, NY (US);

Joseph Benjamin Ross, Cincinnati, OH (US);

Donald Wagner Hamilton, Burnt Hills, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for generating a mask for use with a light measurement system that includes a light source for projecting light onto an object, and an imaging sensor for receiving light reflected from the object. The method includes determining a profile of the object to be inspected, and generating an electronic mask based on the determined object profile. The electronic mask has an electronic opening having a profile defined to substantially match the determined object profile as viewed from one of the light source and the imaging sensor.


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