The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
May. 25, 2004
Masahiro Toida, Kanagawa, JP;
Masahiro Toida, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A laser annealing system and apparatus, which includes a laser light source, which emits a laser beam through an a-Si layer on a substrate, an optical unit which forms an optical path along which the laser beam is transmitted through a subject to be annealed, and a first reflecting component, which reflects the laser beam that has been transmitted through the subject so that a direction of the laser beam is reversed along the optical path along which the laser beam is transmitted through the subject, to irradiate the subject. Since an operation in which energy is absorbed is repeated plural times when the laser beam is transmitted through the a-Si layer, input energy of the laser beam can be utilized without waste.