The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2008

Filed:

Mar. 30, 2005
Applicants:

Elizabeth L. Walker, Nazareth, PA (US);

Jeffrey A. Barnes, Nazareth, PA (US);

Shahriar Naghshineh, Allentown, PA (US);

Kevin P. Yanders, Germansville, PA (US);

Inventors:

Elizabeth L. Walker, Nazareth, PA (US);

Jeffrey A. Barnes, Nazareth, PA (US);

Shahriar Naghshineh, Allentown, PA (US);

Kevin P. Yanders, Germansville, PA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/30 (2006.01); C11D 1/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning solution is provided for cleaning metal-containing microelectronic substrates, particularly for post etch, via formation and post CMP cleaning. The cleaning solution consists of a quaternary ammonium hydroxide, an organic amine, and water. A preferred cleaning solution consists of tetramethylammonium hydroxide, monoethanolamine, and water. The pH of cleaning solution is greater than 10.


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