Method for coating an organic layer onto a substrate in a vacuum chamber

Abstract

A vapor deposition source for use in vacuum chamber for coating an organic layer on a substrate of an OLED device, includes a manifold including side and bottom walls defining a chamber for receiving organic material, and an aperture plate disposed between the side walls, the aperture plate having a plurality of spaced apart apertures for emitting vaporized organic material; the aperture plate including conductive material which in response to an electrical current produces heat; means for heating the organic material to a temperature which causes its vaporization, and heating the side walls of the manifold; and an electrical insulator coupling the aperture plate to the side walls for concentrating heat in the unsupported region of the aperture plate adjacent to the apertures, whereby the distance between the aperture plate and the substrate can be reduced to provide high coating thickness uniformity on the substrate. A method for coating an organic layer on onto a substrate in a vacuum chamber includes providing a manifold including side and bottom walls defining a chamber for receiving organic material. and an aperture plate disposed between the side walls, the aperture elate having a plurality of spaced apart apertures for emitting vaporized organic material; heating the organic material to a temperature which causes its vaporization, and the side walls of the manifold, the aperture plate includes a first aperture plate emissive surface that radiates energy into the chamber and a second aperture plate emissive surface that radiates less energy to the substrate wherein the second aperture elate emissive surface has an emissivity lower than the first aperture plate emissive surface; and concentrating heat in an unsupported region of the aperture plate adjacent to the apertures by providing an electrical insulator coupling the aperture plate to the side walls.