The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
Oct. 28, 2004
Christopher Daniel Jones, Milford, NH (US);
Christopher Daniel Jones, Milford, NH (US);
Saint-Gobain Ceramics & Plastics, Inc., Worcester, MA (US);
Abstract
An improved technique that reduces the potential for trapped impurities and/or ensuring desired stoichiometry of a grown crystal. Improved contaminant removal is obtained by bubbling a scavenger gas, such as fluorine gas or hydrogen fluoride gas, through a melt of alkaline- or alkali-earth halides, to improve the purity of the melt by removing more volatile metal halides and oxygen contained within the melt. By reacting after the raw material has melted, any oxygen or metal impurities trapped in the raw material is free to react with the scavenger. A desired stoichiometry is achieved as the alkaline- or alkali-earth metals react with the halide in the scavenger gas. Decreasing the amount of impurities in the melt, and using a desired stoichiometeric melt, improves the radiation hardness and transmission properties of resulting ingot grown from the purified raw material. Additionally, this method may decrease the amount of time needed for outgassing. The method may also be used to form a high purity pre-melt, which in turn may be used to grow an ingot with higher purity.