The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
Sep. 30, 2004
Amanda Baer, Campbell, CA (US);
Hamid Balamane, Palo Alto, CA (US);
Daniel Wayne Bedell, Gilroy, CA (US);
Jyh-shuey Jerry Lo, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Aron Pentek, San Jose, CA (US);
Yvette Winton, San Francisco, CA (US);
Amanda Baer, Campbell, CA (US);
Hamid Balamane, Palo Alto, CA (US);
Daniel Wayne Bedell, Gilroy, CA (US);
Jyh-Shuey Jerry Lo, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Aron Pentek, San Jose, CA (US);
Yvette Winton, San Francisco, CA (US);
Abstract
Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.