The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Mar. 24, 2003
Applicants:
Eiichi Tamiya, 1-1, Asahidai, Nomi-shi, Ishikawa 923-1292, JP;
Toshiaki Tanaka, Tokyo, JP;
Toshiki Morita, Tokyo, JP;
Inventors:
Eiichi Tamiya, 1-1, Asahidai, Nomi-shi, Ishikawa 923-1292, JP;
Toshiaki Tanaka, Tokyo, JP;
Toshiki Morita, Tokyo, JP;
Assignees:
Hitachi Software Engineering Co., Ltd., Kanagawa, JP;
Other;
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
The absorbance of samples in a number of wells on a microchamber array is efficiently read in a short period of time. The microchamber array is simultaneously irradiated with monochromatic light. Well-transmitted light is captured via a telecentric optical system () by an imaging camera () as an image, and the absorbance of the sample in each well is individually calculated.