The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Sep. 15, 2004
Matthew I. Egbe, West Norriton, PA (US);
Jennifer M. Rieker, Bethlehem, PA (US);
Darryl W. Peters, Stewartsville, NJ (US);
Irl E. Ward, Bethlehem, PA (US);
Matthew I. Egbe, West Norriton, PA (US);
Jennifer M. Rieker, Bethlehem, PA (US);
Darryl W. Peters, Stewartsville, NJ (US);
Irl E. Ward, Bethlehem, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.