The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Oct. 18, 2005
Applicant:
Andrey Zagrebelny, Eagan, MN (US);
Inventor:
Andrey Zagrebelny, Eagan, MN (US);
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); B44C 1/22 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a polished semiconductor structure comprises polishing a surface of a semiconductor structure by chemical mechanical polishing. Pressure applied to the surface is reduced during the polishing, or a rotation rate of a polishing surface relative to the surface is reduced during the polishing.
Zagrebelny, Andrey. (2008). Cmp process (U.S. Patent No. 7361602). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7361602
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile