The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2008

Filed:

Mar. 01, 2006
Applicants:

John R. Fyson, Hackney, GB;

Christopher B. Rider, New Malden, GB;

Inventors:

John R. Fyson, Hackney, GB;

Christopher B. Rider, New Malden, GB;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of producing a relief structure on a patterned conductor comprises the steps of; coating a layer of conductive material onto a transparent substrate, coating a layer of metal onto the layer of conductive material, coating a layer of photoresist onto the layer of metal, curing the layer of photoresist, exposing a desired pattern of transparent conductors through a first mask onto the layer of photoresist, developing the photoresist and simultaneously etching the layer of the conductive material and the layer of metal, exposing a desired pattern of metal conductors through a second mask onto the remaining layer of photoresist, developing the photoresist and etching the layer of metal, applying a further layer of photoresist, curing the further layer of photoresist, exposing the further layer of photoresist thorough the substrate, developing the photoresist and allowing the layer to dry, resulting in a pattern of spacers/reliefs in registration with the metal conductors.


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