The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Sep. 08, 2005
Applicants:
Young-hyun Kim, Suwon-si, KR;
Yu-dong Bae, Suwon-si, KR;
Jung-kee Lee, Suwon-si, KR;
IN Kim, Suwon-si, KR;
Inventors:
Young-Hyun Kim, Suwon-si, KR;
Yu-Dong Bae, Suwon-si, KR;
Jung-Kee Lee, Suwon-si, KR;
In Kim, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 21/50 (2006.01); G01R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of detecting an etching end-point includes the steps of: forming a mask on a pattern area of an etching object; forming an etching indicator on an etching area of the etching object, which is not covered by the mask; etching the etching object using the mask; and evaluating the size of a remaining object covered by the mask using the etching indicator.