The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Nov. 05, 2004
Martin Richardson, Geneva, FL (US);
Chiew-seng Koay, Orlando, FL (US);
Kazutoshi Takenoshita, Oviedo, FL (US);
Martin Richardson, Geneva, FL (US);
Chiew-Seng Koay, Orlando, FL (US);
Kazutoshi Takenoshita, Oviedo, FL (US);
Research Foundation of the University of Central Florida, Orlando, FL (US);
Abstract
Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.